| 000 | 00697nam a2200169Ia 4500 | ||
|---|---|---|---|
| 008 | 140223b2005 xxu||||| |||| 00| 0 eng d | ||
| 020 |
_a9781598293548 _c0.00 |
||
| 082 |
_a537.24 _bKIM |
||
| 100 | _aKim, Young-Hee | ||
| 245 | _aHf-Based High-k Dielectrics: Process Development, Performance Characterization and Reliability | ||
| 260 |
_aUSA _bMorgan & Claypool Publshers _c2005 |
||
| 300 | _a92p | ||
| 600 | _aElectronic Engineering | ||
| 700 | _aLee, Jack C. | ||
| 890 | _aUSA | ||
| 995 |
_AKIM _B007797 _CECT-NIT _D1032.30 _E0 _F049 _G4332 _H0 _I0.00 _J1395.00 26% _L20081006 _M16 _UC _W20081014 _XMahajan Book Depot _ZGeneral |
||
| 999 |
_c34489 _d34489 |
||