Hf-Based High-k Dielectrics: Process Development, Performance Characterization and Reliability

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Material type: Text

TextPublication details: USA Morgan & Claypool Publshers 2005Description: 92pISBN:

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Holdings
Item type	Current library	Item location	Collection	Call number	Status	Date due	Barcode	Item holds
Book	NIMA Knowledge Centre	9th Floor Reading Zone	General	537.24 KIM (Browse shelf(Opens below))	Available		T0034142

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